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Ruthenium Oxide Seeding of Electroless Copper Deposition

IP.com Disclosure Number: IPCOM000059530D
Original Publication Date: 1988-Nov-01
Included in the Prior Art Database: 2005-Feb-16

Publishing Venue

IBM

Related People

Authors:
O'Sullivan, EJM White, JR [+details]

Abstract

Ruthenium oxides are used as a seed catalyst for initiating electroless metal deposition.