Browse Prior Art Database

Vacuum-Compatible Low Contamination Wafer-Orientor System

IP.com Disclosure Number: IPCOM000060006D
Original Publication Date: 1986-Feb-01
Included in the Prior Art Database: 2005-Mar-08

Publishing Venue

IBM

Related People

Authors:
Kulak, J Labinsky, S Lee, AR Moore, RL [+details]

Abstract

In semiconductor manufacturing, the alignment of wafers for processing is a critical step. A system is described for orienting the wafers with a minimum of contamination and no mechanical contact with the wafer edge or top surface. The wafer orientor can also be used within vacuum systems. The system is shown in Fig. 1, with the wafer 1 supported by a pedestal 2. In orienting the wafer, the objective is to align the center of the wafer with the axis of the pedestal. The pedestal 2 supports the wafer 1 and has both rotary (r) and vertical (z) motion. A high resolution micro-stepping motor 3 directly drives the pedestal 2 in the r direction, while the vertical movement is provided by a motor and eccentric cam arrangement (not shown).