Browse Prior Art Database

Parallel Plate Reactive Ion Etch Plasma Space Modification And Foreign Material Elimination

IP.com Disclosure Number: IPCOM000060089D
Original Publication Date: 1986-Feb-01
Included in the Prior Art Database: 2005-Mar-08

Publishing Venue

IBM

Related People

Authors:
Kerbaugh, ML [+details]

Abstract

To improve the uniformity of resist etching and to reduce the amount of foreign material which could fall on the wafer resist mask due to sputtering during the etch process, a thin polycarbonate resin disk shield may be mounted under the upper electr