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Etching Mask for Ceramic Substrate

IP.com Disclosure Number: IPCOM000060120D
Original Publication Date: 1986-Feb-01
Included in the Prior Art Database: 2005-Mar-08

Publishing Venue

IBM

Related People

Authors:
Bianchi, JK Gdula, RA Welsh, LW [+details]

Abstract

A method for masking a ceramic substrate for a reactive ion etching (RIE) process is described in which the mask is produced from an RIE resistant metal.