Magnetic Field Enhanced Hydrogen Reactive Ion Etching of Metals
Original Publication Date: 1986-Mar-01
Included in the Prior Art Database: 2005-Mar-08
Enhanced etch rates of hydrogen RIE of metals with a magnetic field applied have the advantages of no redeposition and no edge deterioration which usually accompany with argon ion sputtering. Besides, H2-RIE can operate at a higher pressure. Hydrogen should be mixed with helium in practical operations.