Polysiloxane Dielectric for Multi-Level Metal
Original Publication Date: 1986-May-01
Included in the Prior Art Database: 2005-Mar-09
By spin application of a hydrolyzed organosilane monomer (e.g., an aqueous solution of 3-aminopropyltriethoxy silane) and subsequent heat treatment, an SiO2 film is formed on polyimide. This process economically forms a film on polyimide which is (1) adherent, (2) a good etch stop layer, and (3) resistant to permeation by water vapor. The latter property makes it useful as a final film layer over wiring having an overcoating of polyimide. Adherent films of SiO2 are formed on polyimide by spin applying the hydrolyzed monomer (e.g., A1100) and heat treating at 160 degrees centigrade for 20 minutes on a hot plate. Films ranging in thickness from 0.1 to 1.5 microns are reproducibly formed by controlling dilution and spin speed. Uniform coating is assisted by the addition of a wetting agent.