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Nanostructures for High Resolution Measurements of Magnetic Fields

IP.com Disclosure Number: IPCOM000061044D
Original Publication Date: 1986-Jun-01
Included in the Prior Art Database: 2005-Mar-09

Publishing Venue

IBM

Related People

Authors:
Best, JS Horne, DE Hoyt, RF Laibowitz, RB Umbach, CP [+details]

Abstract

Described below are methods of fabricating high resolution sensors using electron beam nanolithography. The two methods discussed are contamination and lift-off nanolithography. The sensors, so produced, can measure magnetic field variations over distances as small as 10 nm. The operation of a number of devices (for example, magnetic recording heads) is dependent on the magnetic properties of the device. An accurate determination of these properties is an important contributing factor in the optimization of the device performance. Inductive microloops [1], magnetoresistive sensors [2], and miniature Hall probes [3] have all been developed to measure the distribution of magnetic fields on a local scale. The resolution of these sensors has been limited from 0.