Mann 4800 Exposure Field Uniformity Test
Original Publication Date: 1986-May-01
Included in the Prior Art Database: 2005-Mar-09
Uniform illumination intensity of light within the whole illumination field of a step and repeat camera is important for proper execution of photolithographic processes on semiconductor wafers. This article summarizes a method of locating and measuring large and small scale nonuniformities of illumination within an exposure field.