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Integrating Mask Registration and Critical Image Test Features Into a Common Diagnostics to Improve Mask Product Disposition

IP.com Disclosure Number: IPCOM000061723D
Original Publication Date: 1986-Sep-01
Included in the Prior Art Database: 2005-Mar-09

Publishing Venue

IBM

Related People

Authors:
Hsia, LC Nahlik, JJ Snell, LW West, RL [+details]

Abstract

A method has been proposed for improving the quality and efficiency of mask product disposition in semiconductor manufacturing processes. The new development proposes combining the mask critical image (MCI) and box-in-box targets into one structure. Under conventional techniques, conventional mask product disposition targets--box-in-box and MCI--are located in different areas of the cell kerf (Fig. 1). The mask dimensional quality disposition decision cannot be made until both diagnostic targets are measured on the appropriate number of cells within the array and then each of the two data file sets transferred to a programming language (APL) for analysis. This procedure is cumbersome requiring two separate measurement files, measurement of two different targets, and two different data file transfer operations. In Fig.