Chrome Surface Contamination Standard
Original Publication Date: 1986-Aug-01
Included in the Prior Art Database: 2005-Mar-09
A technique is described which will produce a semiconductor photomask surface contamination and defect standard in the 0.5 um to 1.0 um range for use as a calibration tool for photomask particle detection systems. The standard may be cleaned and reused many times without deterioration.