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A Process for Obtaining Positive Resist Slopes

IP.com Disclosure Number: IPCOM000061879D
Original Publication Date: 1986-Jul-01
Included in the Prior Art Database: 2005-Mar-09

Publishing Venue

IBM

Related People

Authors:
Barber, JR Stanasolovich, D Theisen, JF [+details]

Abstract

Resist slopes can be tailored by using an optical stepper in conjunction with an automatic reticle changer. For example, if a positive resist slope is desired, the resist can first be exposed through a mask having dimensions N x N. Next, the automatic reticle changer will align a second mask having dimensions M x M, where M is greater than N, and the photoresist will again be exposed. This masking sequence would be carried out on each wafer.