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An ion milling process is described in which a mixture of argon and hydrogen is used which enables better control over the milling process.
English (United States)
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Ion Milling With Argon And Hydrogen Mixture
An ion milling process is described in which a mixture of argon and hydrogen
is used which enables better control over the milling process.
A commonly used masking material for ion milling operations is photoresist.
However, when milling reactive metals such as Cr, Ti, Ta, NiFe, etc. with argon
ion bombardment, the milling rates of the photoresist masking material and/or the
reactive metals may vary widely from run to run. It was found that the addition of
about 5% hydrogen into the milling chamber produced consistent milling rates for
both the photoresist material and the metal. The figure shows that the milling
rate is a function of the ion beam incidence angle, so by choice of this angle and
the introduction of hydrogen, a thinner layer of masking material can be used.