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Submicron Photolithography

IP.com Disclosure Number: IPCOM000061970D
Original Publication Date: 1986-Aug-01
Included in the Prior Art Database: 2005-Mar-09

Publishing Venue

IBM

Related People

Authors:
Jackson, TN Pepper, G [+details]

Abstract

Smaller dimensions can be achieved by formation of high aspect ratio photolithographic resist members followed by isotropic dry etching in which the width dimension is reduced more rapidly than the vertical dimension.