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Enhanced Plasma Etching of Cermet

IP.com Disclosure Number: IPCOM000062238D
Original Publication Date: 1986-Oct-01
Included in the Prior Art Database: 2005-Mar-09

Publishing Venue

IBM

Related People

Authors:
Babu, SV Chan, KK Hoffarth, JG Malueg, VJ [+details]

Abstract

It is known that a plasma process can be used to remove cermet material from a ceramic substrate. The cycle time of the plasma reaction required to remove cermet from a ceramic substrate can be reduced by cycling the plasma reaction through a number of mini steady state conditions.