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The removal of small, micron-size particles from a surface by an electric field can be accomplished more advantageously within a high-quality vacuum system.
English (United States)
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Particle Removal And Analysis Method
The removal of small, micron-size particles from a surface by an electric field
can be accomplished more advantageously within a high-quality vacuum system.
A structural arrangement within a vacuum chamber designed for particle
removal and analysis is shown in the FIGURE. Conducting substrate 1 having
particles 2 thereon is connected to DC power supply 3. The opposite polarity
terminal of the power supply is connected to electrode 4. Monitoring the gap
between substrate 1 and electrode 4 are a pair of light beam sources 5 with
respective beam sensors 6 and an oscilloscope 7. The level of particle charge
applied in a high-quality vacuum, such as one-millionth torr., can be increased to
much higher values then at atmospheric pressure, and the process reduces
particle adhesion while being compatible with electron beam charging techniq
Additionally, particle analysis can be performed by measuring properties of
particle behavior. Particle velocity, mass a acceleration can be determined from
charge changes at the electrode or by timing light beam interruption. Size,
charge, adhesion force, coefficient of restitution, phase, and electrode surface
character can also be deduced from various measurements. These data are
important for cleaning and for prevention of particle release.