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Alignment Control on Test Site Disclosure Number: IPCOM000062385D
Original Publication Date: 1986-Nov-01
Included in the Prior Art Database: 2005-Mar-09

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Bonnet, J [+details]


On most commercially available step and repeat machines, alignment control of the cells at level N+1, with respect to the cells at level N, implies developing the wafer, to reveal the pattern at level N+1. The proposed method avoids this developing in certain conditions, and thus saves time.