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Device for Washing Gases

IP.com Disclosure Number: IPCOM000062390D
Original Publication Date: 1986-Nov-01
Included in the Prior Art Database: 2005-Mar-09

Publishing Venue

IBM

Related People

Authors:
Deseez, C Mathieu, M Monteux, G [+details]

Abstract

The purpose of this device is to wash toxic/corrosive gases coming out of furnaces and heavily doped with impurities, such as boron, phosphorus, and hydrochloric acid, after completion of the various thermal steps of a semiconductor process (diffusion, oxidation, etc.), the gases being subsequently ejected into the atmosphere after being cleaned and decontaminated. Referring to the figure, it can be seen that hot toxic gas goes into low body A of the gas washing device, through filtering elements B located on washing rings so that the duration of the exchange between the water coming through injector D and the gas is as long as possible. The gas having been cooled and washed, then goes into high body C and is expelled through conduit E into the atmosphere. Water is drained through connector J.