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Improved Method of Exposing Resists With Lasers Disclosure Number: IPCOM000062741D
Original Publication Date: 1986-Nov-01
Included in the Prior Art Database: 2005-Mar-09

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Fredericks, EC Mueller, RP Via, GG [+details]


In semiconductor processing, it is desirable to use near monochromatic light, such as lasers, for defining sub-micron ima In other processing steps, it is desirable to have a more incoherent exposure source for defining sloped profiles, such as for metal lift-off or contact formation. This invention provides an optical system that can be tailored to provide the type of light desired for a specific process level.