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Chemical Vapor Deposition of Gold

IP.com Disclosure Number: IPCOM000062753D
Original Publication Date: 1986-Nov-01
Included in the Prior Art Database: 2005-Mar-09

Publishing Venue

IBM

Related People

Authors:
Baum, TH Jackson, RL Larson, CE [+details]

Abstract

Gold metal can be deposited by chemical vapor deposition (CVD) from a complex of trivalent gold: dimethyl gold (III) acetylacetonate (DMG acac). Exposing a heated surface to the vapo this complex gives excellent quality metal with resistivities approaching that of bulk gold. This is quite unexpected, since gold in the complex is in an oxidation state of +3; in spite of this, a reducing atmosphere is not necessary to produce gold films by CVD from DMG acac. In addition, gold films can be deposited at surprisingly low temperatures; deposition proceeds at temperatures below 300C. Dimethylgold (III) acetylacetonate and derivatives are ideal precursors for the thermal deposition of high purity gold metal.