Brush Cleaning Procedure for Reducing Foreign Materials in a PECVD Longitudinal Reactor
Original Publication Date: 1985-Jan-01
Included in the Prior Art Database: 2005-Feb-18
Using a PECVD (Plasma Enhanced Chemical Vapor Deposition) longitudinal reactor for a thin film deposition, the particulate contamination of the device wafers is strongly dependant on the dust density being on the surface of the boat (wafer holder). The following procedure reduces the foreign material density on the wafers by brushing the boat surface before every product run. - The boat must be at ambient temperature before starting. - A cylindrical brush, the diameter being slightly wider than the rail spacing, is used. This brush can be made of nylon or plastic material. - The brush is used to break the flakes from the sides of the rails by running the brush between the rails. - A nitrogen gun is then used to blow the dust from the boat. - Care should be taken to avoid dust contamination.