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Process for Fabricating Sharply Defined Multilayer Thin Film Structures

IP.com Disclosure Number: IPCOM000063324D
Original Publication Date: 1985-Mar-01
Included in the Prior Art Database: 2005-Feb-18

Publishing Venue

IBM

Related People

Authors:
Cuomo, JJ Harper, JM [+details]

Abstract

A process for fabricating sharply defined multilayer thin film structures uses an ion beam bombardment of the growing film, that is modulated in such a manner as to vary the film composition in a predetermined sequence. The key element is the ability to modulate this substrate ion beam with an abrupt change in output, caused by switching from, for example, low to high anode voltage. The ion beam output can be modulated in this manner within milliseconds, allowing sharp interfaces to be built into a multilayer thin film structure. This fabrication can be embodied in two different ways. Fig. 1 shows a dual ion beam sputtering system.