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Protective Cover for the Anode of a Plasma Enhanced Chemical Vapor Deposition Tool

IP.com Disclosure Number: IPCOM000063332D
Original Publication Date: 1985-Mar-01
Included in the Prior Art Database: 2005-Feb-18

Publishing Venue

IBM

Related People

Authors:
Erickson, AJ Noel, YJ Sutton, RJ [+details]

Abstract

Prior-art plasma enhanced chemical vapor deposition (PECVD) tools employ a large, plate-like anode. During the course of depositing insulator compositions, such as silicon nitride, the anode surface becomes coated with contaminating substances which diminish the effectiveness of the anode. Therefore, in prior-art PECVD chambers, the anode must be demounted from the chamber housing and carefully cleaned. Such cleaning operations typically employ the use of dangerous acids, such as hydrofluoric acid, and therefore constitute not only a detraction to the efficiency of the apparatus, but also a chemical safety hazard.