Octagonal Beam-Shaping Aperture for E-Beam Lithography
Original Publication Date: 1985-Mar-01
Included in the Prior Art Database: 2005-Feb-18
Described is a new E-beam shaping technique that produces smooth pattern edges on 45Œ lines which are required in integrated circuit patterns. This technique utilizes an octagonal shadow mask in place of one of the square masks used in contemporary pattern-generating equipment. Prior methods require the incremental repetition of a rectangular spot to develop a staircase or sawtooth pattern edge at 45Œ. The new technique can be implemented without equipment modification, will increase the throughput of products requiring 45Œ lines, and will result in a significant improvement in line quality. This technique is compatible with existing equipment to vary the orthogonal dimensions while at the same time producing a smooth 45Œ pattern edge.