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Method of in Situ Plasma Process Exhaust Analysis and Monitoring Using Infrared Spectroscopy

IP.com Disclosure Number: IPCOM000063398D
Original Publication Date: 1985-Mar-01
Included in the Prior Art Database: 2005-Feb-18

Publishing Venue

IBM

Related People

Authors:
Blackwell, KJ White, RF [+details]

Abstract

The present method of exhaust analysis is performed on samples which have been removed from the exhaust by being pulled into a container which has been evacuated to a lower pressure. The transfer has to be performed with uncontaminated components, and any leak will render the sample useless. But if the sample can be collected properly, the sample and its container must be transported to an area which maintains an analyzer. This time for transport is costly and sometimes results in contamination of the samples. This article describes a method of analyzing emissions from a plasma system during the actual process. The method utilizes an infrared spectrometer which is installed at the exhaust pipe 11 of the plasma system pump (Fig. 1).