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Method of Manufacturing Thin Films With Magnetic Anisotropy

IP.com Disclosure Number: IPCOM000063488D
Original Publication Date: 1985-Mar-01
Included in the Prior Art Database: 2005-Feb-18

Publishing Venue

IBM

Related People

Authors:
Nelson, N Reith, TM [+details]

Abstract

Magnetic thin films must be anisotropically oriented to be useful in many applications, such as magnetoresistive sensor elements. This orientation has been obtained by applying a strong magnetic field to the substrates during deposition of the thin films. It has been discovered that strongly oriented films can be obtained during sputter deposition of the film by rotating the substrate relative to the target. The figure shows a schematic view of a sputtering system from the top of a main sputtering chamber. Sputtering targets are located in positions 1, 2 and 3 and sputter etching and heating is performed at position 4. Substrates are placed on circular substrate holder 5 which is moved from load lock chamber 6 to main chamber 7.