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Method of Monitoring the Vapor Deposition of Thin Layers Disclosure Number: IPCOM000063836D
Original Publication Date: 1985-Apr-01
Included in the Prior Art Database: 2005-Feb-18

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Schrader, M Weiss, H [+details]


The described method serves to determine the actual respective lay thickness, concentration and concentration/depth gradients in the individual regions during the deposition of thin layers. A monitoring sample (substrate) 1 is positioned directly adjacent to the workpiece on which a layer is to be deposited and, during operation, is continuously shifted parallel to a mask 2 (Fig. 1). Depending upon the layout of the mask, the chronological sequence of the operating process is differently represented on the substrate. Fig. 2A shows the complete layer 3 deposited without a mask. If mask 2 comprises, for example, a long slot 4 in the direction of advance, a wedge-shaped coating 5 (Fig. 2B), representing an extremely flat section through the layer deposited without a mask, is obtained.