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Field Oxide Uniformity Process Disclosure Number: IPCOM000064069D
Original Publication Date: 1985-May-01
Included in the Prior Art Database: 2005-Feb-18

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Diddell, D Johnson, R Tice, H Wu, G [+details]


This disclosure describes a new process step sequence in a contemporary oxidation process that introduces steam into the chamber immediately after the ramp temperature has stabilized. The introduction of steam at the start of the oxidation cycle lifts the nitride from the silicon surface and permits the uniform oxidation of the entire exposed silicon substrate. The introduction of steam after temperature stabilization is continued for a 7-minute time period, as opposed to the contemporary 3-minute step used in the standard process. The implementation of this new sequence does not require any equipment changes and does not impact any of the performance parameters of the final product. This technique is applicable in any process area where nitride deposition is followed by an oxidation operation.