Electron Beam Inspectable Glass Mask
Original Publication Date: 1985-May-01
Included in the Prior Art Database: 2005-Feb-18
This article describes a unique fabrication process of a glass mask used in the semiconductor fabrication process. The resulting mask exhibits the qualities required for image resolution and E-beam inspection. This is accomplished by applying a thin layer of an electrically conductive material to the heavy metal layer of the mask. The use of a new thin layer will provide the desired optical characteristics for normal mask use and will eliminate the presently encountered undesirable optical reflectivity effects encountered during water fabrication. While the thin coating will provide the desired optical characteristics, the heavy metal layer will provide the electron backscattering required for E-beam inspection.