Wafer Boat Transport System
Original Publication Date: 1985-May-01
Included in the Prior Art Database: 2005-Feb-18
This article describes a simple electromechanical method for loading/ unloading and precisely positioning wafer carrier boats inside a cylindrically shaped plasma etch reactor chamber. In order to load this manufacturing tool from the operator position, a cylindrical hood is raised and the flat circular base plate under the hood is exposed. The plate is divided into four sectors, two of which are truncated "pie"-shaped plasma etch stations located 180 degrees apart, and two other similarly shaped sectors are wafer elevator stations upon which the carrier boxes are placed. In the center space created by the four truncated "pie"-shaped sectors is the wafer pick and place mechanism. See Fig. 1. Upon command, the hood is raised to initiate a load sequence.