Browse Prior Art Database

Novel Linear Evaporator for Vlsi Thin Films

IP.com Disclosure Number: IPCOM000064177D
Original Publication Date: 1985-Jun-01
Included in the Prior Art Database: 2005-Feb-18

Publishing Venue

IBM

Related People

Authors:
Fredericks, EC Polavarapu, MS Via, GG [+details]

Abstract

A vacuum evaporator chamber is disclosed wherein wafers are mounted on a carousel and are sequentially presented in front of a collimated beam of evaporated atoms which are to be deposited on the wafers. By maintaining the beam in a collimated form, uniform etching characteristics will be obtained over a wafer and from one wafer to another. The apparatus is especially useful in lift-off-type photolithography, since the collimated beam is "stopped down" at the edges of the trench on the wafer, so that the side "fencing" effect will not take place. Fig. 1 shows a side view of a cylindrically shaped chamber 1 having a vacuum port 2 so as to enable the chamber to be pumped down to a suitable vacuum. A side door 3, where the chamber 1 is hinged so as to open and enable access to the interior of the chamber, is shown in Fig. 2.