Browse Prior Art Database

X-Ray Photoresist Exposure Camera

IP.com Disclosure Number: IPCOM000064192D
Original Publication Date: 1985-Jun-01
Included in the Prior Art Database: 2005-Feb-18

Publishing Venue

IBM

Related People

Authors:
Fredericks, EC Polavarapu, MS Via, GG [+details]

Abstract

The short wavelength of X-rays makes them highly desirable for very precise photolithography of less than one-micron structures. However, the penetrating nature of such X-rays imposes the requirement of relatively long, narrow aperture X-ray collimators in order to obtain useful collimated beams of X-rays for X-ray lithography applications. An apparatus is disclosed herein to improve the throughput of X-ray lithographic processes employing narrow aperture X-ray collimators. The figure shows a cylindrical chamber 1 which has an X-ray source 2 located at the center thereof. A narrow aperture X-ray collimator 3 is positioned in front of the X-ray emission port for the X-ray source 2, along one radius of the chamber 1. The mask 4 is located at the peripheral end of the collimator 3.