Original Publication Date: 1985-Jul-01
Included in the Prior Art Database: 2005-Feb-18
This article relates generally to integrated circuit fabrication and more particularly to reticle selection for projection masks. A reticle can be quickly selected from among a plurality of reticles for step-and-repeat exposure of a target surface by fixedly arranging the reticles about a rotatable mirror and light source. Referring to the figures, a plurality of reticles 1, 8 and 9 are mounted in openings 2 about the periphery of a fixed, circular frame 3, as shown. Alternately, reticles 8 and 9 can be mounted at 30Œ and -30Œ with respect to the vertical axis to avoid having to rotate the wafer. Light from source 4 is directed along light fiber bundle 5 and condenser lens assembly 6 through a selected opening 2 and its associated reticle 1.