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Laser Etching of Ceramic Thin Films

IP.com Disclosure Number: IPCOM000064623D
Original Publication Date: 1985-Aug-01
Included in the Prior Art Database: 2005-Feb-19

Publishing Venue

IBM

Related People

Authors:
Leary-Renick, PA Wassick, TA [+details]

Abstract

Presented is a technique to ultraviolet laser etch ceramic through a selective blocking mask pattern, thus eliminating the need for photolithography or special etching atmospheres. The process is not limited to etching interconnections through a thin film of ceramic. Ceramic materials are ideally suited to the formation of multiple-layer structures. New layers can be deposited and fired on top of existing layers, resulting in a continuous, homogeneous structure. By pattern etching a ceramic layer with the laser and subsequently depositing metallurgy into the generated grooves, a planar structure can be formed. The process can then be repeated after deposition of an additional ceramic layer, permitting production of high performance, multi-level packages.