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Via Etching of Ceramic Green Sheets With Excimer Laser Radiation

IP.com Disclosure Number: IPCOM000064667D
Original Publication Date: 1985-Aug-01
Included in the Prior Art Database: 2005-Feb-19

Publishing Venue

IBM

Related People

Authors:
Leung, GB Wassick, TA [+details]

Abstract

A method has been developed to use excimer laser radiation to do via etching of green sheet ceramics. This is a rapid, non-contact technique with a high degree of flexibility. A most likely wavelength for the etching is in the ultraviolet at 193 nanometers (nm). This radiation is produced by the ArF (argon fluorine) excimer laser. It has been effective in producing nearly vertical walled holes in a variety of polymer films with high aspect ratios. The etching mechanism generates a high local vapor pressure due to the fragmentation of the polymer chains into smaller and smaller pieces. The unbound ceramic particles present in the green sheet will be expelled with the escaping polymer fragments and can be easily re moved by suction.