Apparatus and Method for Water Injection Into a Pressurized Gas Stream
Original Publication Date: 1985-Sep-01
Included in the Prior Art Database: 2005-Feb-19
This publication describes an apparatus and general method for controlling the water content of a gas stream under pressure and, more specifically, applies to the saturation of a high pressure reaction gas flow used in silicon wafer oxidation. For a wet oxidation of silicon process, conventional high pressure systems use either pyrogenic steam, from the reaction between H2 and O2 gases, or steam generated by pumping water directly into the reactor vessel. These methods have several limitations. Pyrogenic steam requires the use of a potentially hazardous pressurized hydrogen source, limits oxidation ambients to only H2O/O2 (or H2/O2/N2 in the case of diluted hydrogen) mixtures, and because the reaction takes place in situ, direct measurement of the water content of the mixture is precluded.