Browse Prior Art Database

Automated Wet Process System

IP.com Disclosure Number: IPCOM000064946D
Original Publication Date: 1985-Sep-01
Included in the Prior Art Database: 2005-Feb-19

Publishing Venue

IBM

Related People

Authors:
DeRobertis, I Fury, MA O'Neill, BC Pinckney, WJ [+details]

Abstract

A mechanism has been proposed for automating the handling of semiconductor wafers as they are cleaned and then centrifugally dried in a wet process system. The elimination of manual handling in this phase of the process has the obvious advantage of increased automation as well as improved contamination control. A sample wet process system for which this device was developed may contain several processing stations requiring placement and/or positioning of a wafer carrier (Fig 1). In the process, two or three wafer carriers--each containing up to 25 wafers--are transported in and out of the dip tanks in a basket. The carriers are in a horizontal position during these steps. After wet processing, the wafer carriers must be rotated 90Πfrom the horizontal to be lowered vertically into a centrifuge turntable, for drying.