Glacial Acetic Acid Stripper in Semiconductor Manufacturing Process
Original Publication Date: 1985-Sep-01
Included in the Prior Art Database: 2005-Feb-19
Described is a new method of stripping resist polymethylmethacrylate (PMMA) from a glass mask used in semiconductor fabrication under room ambient conditions. The use of Glacial Acetic Acid as a stripping solution has shown high efficiency and does not leave stains as other stripper solutions may. The disclosed method is also effective in stripping PMMA which has undergone etching via an ion-milling operation. The disclosed method could be useful in stripping other organic- based resist materials. It is especially effective in stripping resist materials after being subjected to high energy process steps.