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High Silicon Content, All Dry Process Packaging Material

IP.com Disclosure Number: IPCOM000064991D
Original Publication Date: 1985-Oct-01
Included in the Prior Art Database: 2005-Feb-19

Publishing Venue

IBM

Related People

Authors:
Goldblatt, RD Green, DC Ouano, A Sooriyakumaran, R [+details]

Abstract

The dry process packaging material, allylundecamethylcyclohexasilane, is a high silicon content low molecular weight oligomer having the following composition: [Si(CH3)2]5 Si(CH3)(CH2CH=CH2) As the material has a high silicon content and contains only Si, C and H, toxicity and environmental problems are minimal. Furthermore, the material can be ashed to SiO2 or SiOx . The material can be converted to a SiOx etch barrier and can be used for planarization. The material has a moderate vapor pressure and can be vapor deposited. Since the material can be developed by heating, the wet processing steps associated with prior-art packaging materials are eliminated. The allylundecamethylcyclohexasilane of the present invention has been evaporated onto a substrate from heptane to form a 1200-Angstrom film.