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Method for Reducing Laser Intensity Attenuation Due to Debris From Etch Products Disclosure Number: IPCOM000065075D
Original Publication Date: 1985-Oct-01
Included in the Prior Art Database: 2005-Feb-19

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Ho, F McCarthy, TD Ritsko, JJ Tomkiewicz, Y [+details]


The present method uses transparent tape to reduce ultraviolet laser intensity attenuation that is caused by debris from the laser etching sticking to the optical elements. The present method employs a thin transparent tape. A film of 2-mil TEFLON* or 1-mil polypropylene has been found effective at fluences up to 0.25 J/cm2 . The transparent tape is placed between the sample and the optical components prior to etching. After each etching operation the transparent tape is moved, and thus the debris collected on the tape is removed and a fresh transparent tape surface is presented. The tape does not limit the etching process. The transmission losses, most of which are due to reflection at the tape surface, are of the order of about 14%.