Design Method for Providing Better Automation of IC Mask Fabrication
Original Publication Date: 1985-Dec-01
Included in the Prior Art Database: 2005-Feb-19
The method described provides a way to fully automatize the IC (integrated circuit) mask design and fabrication by freeing the mask designer of process considerations at the conception step. It allows changes in the process sequence or process tolerances to be implemented without impacting the mask design. Therefore, the method increases the productivity by decreasing the overall design and fabrication cycle time. In the present state of the art, the mask design starts when the fabrication process and tolerance are well defined. a) The first step of the design-fabrication process is then to define the set of design groundrules to be applied by the mask designer. This set is closely related to the process sequence, process and tool tolerances at the time of the rules definition.