Browse Prior Art Database

Silane Alternative Compounds

IP.com Disclosure Number: IPCOM000065520D
Original Publication Date: 1985-Dec-01
Included in the Prior Art Database: 2005-Feb-19

Publishing Venue

IBM

Related People

Authors:
Scott, BA [+details]

Abstract

Silane, SiHH4 ,IS USED IN MANY FABRICATION PROCESSES, INCLUDING CHEMICAL vapor deposition. This compound is decomposable to yield Si. However, many hazards are associated with the use of SiH4, which is highly toxic. A suitable replacement for silane is compound which is safe to handle, easy to use, and nontoxic. The compound must also have a high volatility and be easily decomposed by thermal and plasma techniques. The chemical byproducts of the decomposition must also be highly volatile so as not to leave fragments behind in the deposited silicon, silicon oxide, or silicon nitride deposited films. A series of compounds can be used to replace silane, where the compounds are based on the highly safe tetramethyl silane.