Device/Process for the Characterization of a Semiconductor Lithography Tool
Original Publication Date: 1985-Apr-01
Included in the Prior Art Database: 2005-Feb-19
This article describes a process where a grid coated with gold is used as the base or substrate of a resist layer onto which a pattern will be exposed and developed for the purpose of improving th e accuracy of characterizing the "Footprint" of the particular tool. In addition, this process could be used to characterize tools designe d to perform overlay measurements.