Browse Prior Art Database

Enhanced One Device Cell Containing Polycide N Skin Bitline Without Self-alignment Requirement

IP.com Disclosure Number: IPCOM000065716D
Original Publication Date: 1985-Jul-01
Included in the Prior Art Database: 2005-Feb-19

Publishing Venue

IBM

Related People

Authors:
Brigida, DJ Nickel, DJ Penoyer, RF [+details]

Abstract

The RC component of the bitline is significantly reduced and the access and cycle time of the memory are directly improved by the contact between the polycide line and the N SKIN diffusion.