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Contamination Sweeper for Contamination Free Wafer Processing

IP.com Disclosure Number: IPCOM000065857D
Original Publication Date: 1985-Oct-01
Included in the Prior Art Database: 2005-Feb-19

Publishing Venue

IBM

Related People

Authors:
Via, GG Young, MA [+details]

Abstract

A wafer-sized disk of barium titanate or plastic can be used as a cleaning sweeper for wafer tracks. When heated and electrically treated as an electret, static fields of 5-8 KV can be generated, which is adequate to attract particulate contamination from the wafer track and neighboring areas. The addition of peripherally located slanted grooves to the sweeper will cause it to slowly revolve when on the wafer track.