Browse Prior Art Database

Elimination of Quartz Tunneling

IP.com Disclosure Number: IPCOM000065897D
Original Publication Date: 1985-Nov-01
Included in the Prior Art Database: 2005-Feb-19

Publishing Venue

IBM

Related People

Authors:
McCollum, TJ McCullough, KJ [+details]

Abstract

In the manufacture of semiconductor device, sputtering is used to deposit layers of quartz. Frequently, tunneling of quartz will occur thereby resulting in imperfections in the device. An invention proposes a procedure whereby the quartz deposition run would be aborted and ion milling used to remove the inferior quartz.