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Elimination of Quartz Tunneling Disclosure Number: IPCOM000065897D
Original Publication Date: 1985-Nov-01
Included in the Prior Art Database: 2005-Feb-19

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McCollum, TJ McCullough, KJ [+details]


In the manufacture of semiconductor device, sputtering is used to deposit layers of quartz. Frequently, tunneling of quartz will occur thereby resulting in imperfections in the device. An invention proposes a procedure whereby the quartz deposition run would be aborted and ion milling used to remove the inferior quartz.