Browse Prior Art Database

Clean Vacuum System Technique to Obtain Clean Wafers

IP.com Disclosure Number: IPCOM000065934D
Original Publication Date: 1985-Dec-01
Included in the Prior Art Database: 2005-Feb-19

Publishing Venue

IBM

Related People

Authors:
Ekblom, CJ Gajda, JJ Schnitzel, R Wajda, WW [+details]

Abstract

In the processing of semiconductor wafers, particulate contami- nation from vacuum processing tools can lead to unacceptable rejection rates. Preventive maintenance procedures include frequent cleaning of the vacuum chambers so as to remove particulates. These procedures are time consuming, and the resultant downtime of the vacuum tools leads to increased operating costs. A technique has been developed which cleans the vacuum tools in an effective and relatively rapid manner so as to improve the productivity of the operation.