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Mosaic Sputtering Targets

IP.com Disclosure Number: IPCOM000065957D
Original Publication Date: 1985-Dec-01
Included in the Prior Art Database: 2005-Feb-19

Publishing Venue

IBM

Related People

Authors:
Thompson, RD Tu, KN [+details]

Abstract

The desire to co-sputter silicide films has led to the use of precision machine mosaic targets, such as that shown in Fig. 1. These targets collect contaminants in the many joints. The improved target of Fig. 2 is made by a technique that eliminates these joints and lowers the machining costs.