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Photomask Utilizing Opacified Photoresist Images

IP.com Disclosure Number: IPCOM000066000D
Original Publication Date: 1979-Jan-01
Included in the Prior Art Database: 2005-Feb-19

Publishing Venue

IBM

Related People

Authors:
Fisher, DW [+details]

Abstract

This article teaches that a photomask utilizing opacified photoresist images can be easily and cheaply made with a very simple mask fabrication process.