Browse Prior Art Database

Automatic Wafer Handling System For Electron Beam System

IP.com Disclosure Number: IPCOM000066040D
Original Publication Date: 1979-Jan-01
Included in the Prior Art Database: 2005-Feb-19

Publishing Venue

IBM

Related People

Authors:
Freisitzer, N Judge, RL ONeill, BC Pearson, ES Penzetta, FL Raver, CR [+details]

Abstract

A mechanism is described to carry silicon wafers under computer control and with minimum contamination into and out of an electron beam system. During handling, the wafers are always maintained in a class 100 clean air environment.