Browse Prior Art Database

Photoresist Hardening Techniques For Profile Stability

IP.com Disclosure Number: IPCOM000066054D
Original Publication Date: 1979-Jan-01
Included in the Prior Art Database: 2005-Feb-19

Publishing Venue

IBM

Related People

Authors:
Kaplan, LH Zimmerman, SM [+details]

Abstract

Photoresist patterns must frequently be heated to high temperatures. Under such conditions, changes in the cross-sectional profile of a resist image may occur, making it less useful for its intended purpose.