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Photoresist Hardening Techniques For Profile Stability Disclosure Number: IPCOM000066054D
Original Publication Date: 1979-Jan-01
Included in the Prior Art Database: 2005-Feb-19

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Related People

Kaplan, LH Zimmerman, SM [+details]


Photoresist patterns must frequently be heated to high temperatures. Under such conditions, changes in the cross-sectional profile of a resist image may occur, making it less useful for its intended purpose.